Titan Deposition With VCE


Image Image The production proven Titan Deposition is a loadlocked deposition system with a vacuum cassette elevator. It can be configured for PECVD, HDCVD, PVD, or ALD. The Titan Deposition provides innovative, and leading edge processes in a small footprint at an affordable price.

Standard production processes have been developed for repeatable deposition of SiOx, SiNx, SiC, and a-Si. All backed by over 25 years’ experience in rapid process development.

System Features:
  • PLC and touch screen control
  • Electrostatic, or mechanical chuck
  • Active substrate temperature control
  • Vacuum Cassette Elevator
  • Optional laser, and optical endpoints

PTek, located at Hyderabad, is engaged in offering best equipment and services to the industry and research institutes in the field of Air Filter Testing, Aerosol generation, Semiconductor Process Equipment & Cryogenic systems.