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Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM	Al	x	x	x	99.99 - 99.9999%
ANTIMONY	Sb	x	x	x	99.999 - 99.99999%
ARSENIC	As			x	99, 99.999%
BARIUM	Ba	x		x	99.5%
BERYLLIUM	Be	x	x	x	98 - 99.9%
BISMUTH	Bi	x	x	x	99.9, 99.999%
BORON	B		x	x	99.5%
CADMIUM	Cd	x	x	x	99.999%
CALCIUM	Ca			x	99.5%
CARBON	C	x	x	x	99.999%
CERIUM	Ce	x		x	99.9%
CESIUM	Cs			x	99.95%
CHROMIUM	Cr	x	x	x	99.95%
COBALT	Co	x	x	x	99.9%
COPPER	Cu	x	x	x	99.99, 99.999%
DYSPROSIUM	Dy			x	99.9%
ERBIUM	Er			x	99.9%
GADOLINIUM	Gd			x	99.9%
GALLIUM	Ga			x	99.999, 99.9999%
GERMANIUM	Ge	x	x	x	99.999%
GOLD	Au	x	x	x	99.99, 99.999%
HAFNIUM	Hf	x	x	x	99.9%
HOLMIUM	Ho			x	99.9%
INDIUM	In	x	x	x	99.99 - 99.9999%
IRIDIUM	Ir	x	x	x	99.9%
IRON	Fe	x	x	x	99.9 99.95%
LANTHANUM	La			x	99.9%
LEAD	Pb	x	x	x	99.995%
MAGNESIUM	Mg	x	x	x	99.95%
MANGANESE	Mn	x	x	x	99.9%
MOLYBDENUM	Mo	x	x	x	99.95%
NEODYMIUM	Nd	x	x	x	99.9%
NICKEL	Ni	x	x	x	99.7, 99.995%
NIOBIUM	Nb	x	x	x	99.95%
PALLADIUM	Pd	x	x	x	99.95%
PLATINUM	Pt	x	x	x	99.99%
PRASEODYMIUM	Pr	x	x	x	99.9%
RHENIUM	Re	x	x	x	99.9%
RUBIDIUM	Rb	x	x	x	99.8%
RUTHENIUM	Ru	x	x	x	99.9%
SAMARIUM	Sm			x	99.9%
SCANDIUM	Sc			x	99.9%
SELENIUM	Se	x	x	x	99.999 - 99.9999%
SILICON	Si	x	x	x	99.999%
SILVER	Ag	x	x	x	99.99%
STRONTIUM	Sr			x	99.5%
TANTALUM	Ta	x	x	x	99.95%
TELLURIUM	Te	x	x	x	99.999%
TERBIUM	Tb			x	99.9%
THALLIUM	Tl			x	99.9%
THORIUM	Th			x	99.8%
THULIUM	Tm			x	99.9%
TIN	Sn	x	x	x	99.99%
TITANIUM	Ti	x	x	x	99.7 - 99.995%
TUNGSTEN	W	x	x	x	99.95%
VANADIUM	V	x	x	x	99.9%
YTTERBIUM	Yb	x	x	x	99.9%
YTTRIUM	Y	x	x	x	99.9%
ZINC	Zn	x	x	x	99.99, 99.995%
ZIRCONIUM	Zr	x	x	x	99.7%
ALUMINUM	Al	x	x	x	99.99 - 99.9999%
ANTIMONY	Sb	x	x	x	99.999 - 99.99999%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM - CHROMIUM	(Al)X (Cr)1-X	x	x	x	99.99%
ALUMINUM - COBALT	(Al)X (Co)1-X	x	x	x	99.95%
ALUMINUM- COPPER	(Al)X (Cu)1-X	x	x	x	99.9 - 99.9999%
ALUMINUM - IRON	(Al)X (Fe)1-X	x	x	x	99.99%
ALUMINUM - SILICON	(Al)X (Si)1-X	x	x	x	99.9 - 99.9999%
ALUMINUM - SILICON - COPPER	(Al)X (Si)Y (Cu)Z	x	x	x	99.9 - 99.9999%
ALUMINUM - TITANIUM	(Al)50 (Ti)50	x	x	x	99.95%
CHROMIUM - SILICON MONOXIDE	(Cr)X (SiO)1-X	x	x	x	99.9%
CHROMIUM - NICKEL	(Cr)X(Ni)1-X	x	x	x	99.9%
CHROMIUM - COBALT	(Cr)X(Co)1-X	x	x	x	99.5%
CHROMIUM - COBALT - NICKEL	(Cr)X (Co)Y (Ni)Z	x	x	x	99.5%
COBALT - NICKEL	(Co)X(Ni)1-X	x	x	x	99.5%
IRON - NICKEL (PERMALLOY)	(Fe)19 (Ni)81	x	x	x	99.9%
INDIUM - TIN	(In)X (Sn)1-X	x	x	x	99.99, 99.999%
NICKEL - VANADIUM	(Ni)93 (V)07	x	x	x	99.95%
TITANIUM - TUNGSTEN	(Ti)10 (W)90	x	x	x	99.99%
TITANIUM - TUNGSTEN	(Ti)15 (W)85	x	x	x	99.99%
ALUMINUM - CHROMIUM	(Al)X (Cr)1-X	x	x	x	99.99%
ALUMINUM - COBALT	(Al)X (Co)1-X	x	x	x	99.95%
ALUMINUM- COPPER	(Al)X (Cu)1-X	x	x	x	99.9 - 99.9999%

Metals	Composition	E-Beam Sources	Evap. Mat'ls	Purities
YTTRIUM - BARIUM COPPER OXIDE	1-2-3	x	x	99.9 - 99.999%
BISMUTH - CALCIUM - STRONTIUM - COPPER OXIDE	2-2-2-3	x	x	99.9 - 99.999%
BISMUTH - LEAD - CALCIUM - STRONTIUM - COPPER OXIDE	1.94-0.06-2-2-3	x	x	99.9 - 99.999%
THALLIUM - BARIUM - CALCIUM - COPPER OXIDE	2-2-2-3	x	x	99.9 - 99.999%
ERBIUM - BARIUM - COPPER OXIDE	1-2-3	x	x	99.9 - 99.999%
YTTRIUM - BARIUM COPPER OXIDE	1-2-3	x	x	99.9 - 99.999%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM BORIDE	AlB2	x	x	x	99%
CHROMIUM BORIDE	CrB2	x	x	x	99.5%
HAFNIUM BORIDE	HfB2	x	x	x	99.5%
LANTHANUM BORIDE	LaB6	x	x	x	99.5%
MOLYBDENUM BORIDE	Mo2B5, MoB2	x	x	x	99.5%
NIOBIUM BORIDE	NbB2	x	x	x	99.5%
TANTALUM BORIDE	TaB2	x	x	x	99.5%
TITANIUM BORIDE	TiB2	x	x	x	99.5%
TUNGSTEN BORIDE	WB, W2B	x	x	x	99.5%
VANADIUM BORIDE	VB2	x	x	x	99.5%
ZIRCONIUM BORIDE	ZrB2	x	x	x	99.5%
ALUMINUM BORIDE	AlB2	x	x	x	99%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
BORON CARBIDE	B4C	x	x	x	99.5%
CHROMIUM CARBIDE	Cr3C2	x	x	x	99.5%
HAFNIUM CARBIDE	HfC	x	x	x	99.5%
MOLYBDENUM CARBIDE	MoC	x	x	x	99.5%
NIOBIUM CARBIDE	NbC	x	x	x	99.5%
SILICON CARBIDE	SiC	x	x	x	99.5%
TANTALUM CARBIDE	TaC	x	x	x	99.5%
TITANIUM CARBIDE	TiC	x	x	x	99.5%
TUNGSTEN CARBIDE	WC	x	x	x	99.95%
VANADIUM CARBIDE	VC	x	x	x	99.5%
ZIRCONIUM CARBIDE	ZrC	x	x	x	99.5%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM FLUORIDE	AlF3	x	x	x	99.5%
BARIUM FLUORIDE	BaF2	x	x	x	99.9%
CALCIUM FLUORIDE	CaF2	x	x	x	99.9%
CERIUM FLUORIDE	CeF3	x	x	x	99.9%
LANTHANUM FLUORIDE	LaF3	x	x	x	99.9%
LEAD FLUORIDE	PbF2	x	x	x	99.9%
LITHIUM FLUORIDE	LiF	x	x	x	99.9%
MAGNESIUM FLUORIDE	MgF2	x	x	x	99.9%
SODIUM FLUORIDE	NaF	x	x	x	99.9%
STRONTIUM FLUORIDE	SrF2	x	x	x	99.9%
THORIUM FLUORIDE	ThF4	x	x	x	99.9%
YTTRIUM FLUORIDE	YF3	x	x	x	99.9%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM NITRIDE	AlN	x	x	x	99.5%
BORON NITRIDE	BN	x	x	x	99.5%
HAFNIUM NITRIDE	HfN	x	x	x	99.5%
SILICON NITRIDE	Si3N4	x	x	x	99.9%
TANTALUM NITRIDE	TaN	x	x	x	99.5%
TITANIUM NITRIDE	TiN	x	x	x	99.5%
VANADIUM NITRIDE	VN	x	x	x	99.5%
ZIRCONIUM NITRIDE	ZrN	x	x	x	99.5%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM OXIDE	Al2O3	x	x	x	99.99%
ANTIMONY OXIDE	Sb2O3	x	x	x	99.99%
BARIUM TITANATE	BaTiO3	x	x	x	99.9%
BERYLLIUM OXIDE	BeO	x	x	x	99.5%
BISMUTH OXIDE	Bi2O3	x	x	x	99.9%
BISMUTH TITANATE	Bi4TiO3	x	x	x	99.9%
CERIUM OXIDE	CeO2	x	x	x	99.99%
CHROMIUM OXIDE	Cr2O3	x	x	x	99.9%
DYSPROSIUM OXIDE	Dy2O3	x	x	x	99.9%
ERBIUM OXIDE	Er2O3	x	x	x	99.9%
EUROPIUM OXIDE	Eu2O3	x	x	x	99.5%
GALLIUM OXIDE	Ga2O3	x	x	x	99.999%
GERMANIUM OXIDE	GeO2	x	x	x	99.999%
HAFNIUM OXIDE	HfO2	x	x	x	99.9%
HOLMIUM OXIDE	Ho2O3	x	x	x	99.9%
INDIUM OXIDE	In2O3	x	x	x	99.99%
INDIUM TIN OXIDE	(In2O3)X (SnO2)1-X	x	x	x	99.99%
IRON OXIDE	Fe2O3, Fe2O4	x	x	x	99.5 - 99.9%
LANTHANUM OXIDE	La2O3	x	x	x	99.99%
LEAD TITANATE	PbTiO3	x	x	x	99.9%
MAGNESIUM OXIDE	MgO	x	x	x	99.95%
MANGANESE OXIDE	MnO, MnO2, Mn2O3	x	x	x	99.9%
MOLYBDENUM OXIDE	MoO2, MoO3	x	x	x	99.9%
NEODYMIUM OXIDE	Nd2O3	x	x	x	99.9%
NICKEL OXIDE	NiO	x	x	x	99.9%
NIOBIUM OXIDE	Nb2O5	x	x	x	99.95%
PRASEODYMIUM OXIDE	Pr2O3	x	x	x	99.9%
SAMARIUM OXIDE	Sm2O3	x	x	x	99.9%
SILICON DIOXIDE	SiO2	x	x	x	99.995%
SILICON MONOXIDE	SiO	x	x	x	99.9%
STRONTIUM OXIDE	SrO	x	x	x	99.5%
STRONTIUM TITANATE	SrTiO3	x	x	x	99.9%
TANTALUM OXIDE	Ta2O5	x	x	x	99.9%
THORIUM OXIDE	ThO2	x	x	x	99.9%
TIN OXIDE	SnO2	x	x	x	99.9%
TIN OXIDE - ANTIMONY OXIDE	SnO2 - Sb2O3	x	x	x	99.9%
TITANIUM OXIDE	TiO2, Ti2O3	x	x	x	99.9%
TUNGSTEN OXIDE	WO3	x	x	x	99.9%
YTTRIUM OXIDE	Y2O3	x	x	x	99.9%
ZINC OXIDE	ZnO	x	x	x	99.9, 99.99%
ZIRCONIUM OXIDE	ZrO2	x	x	x	99.9%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
CADMIUM SELENIDE	CdSe	x	x	x	99.995%
LEAD SELENIDE	PbSe	x	x	x	99.95%
MOLYBDENUM SELENIDE	MoSe2	x	x	x	99.9%
NIOBIUM SELENIDE	NbSe2	x	x	x	99.8%
TANTALUM SELENIDE	TaSe	x	x	x	99.4%
TUNGSTEN SELENIDE	WSe2	x	x	x	99.8%
ZINC SELENIDE	ZnSe	x	x	x	99.9%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ALUMINUM SILICIDE	AlSi2	x	x	x	99.5%
CHROMIUM SILICIDE	CrSi2, Cr3Si	x	x	x	99.5%
COBALT SILICIDE	CiSi2	x	x	x	99.5%
HAFNIUM SILICIDE	HfSi2	x	x	x	99.5%
IRON SILICIDE	FeSi2	x	x	x	99.5%
MOLYBDENUM SILICIDE	MoSi2	x	x	x	99.5%
NIOBIUM SILICIDE	NbSi2	x	x	x	99.5%
TANTALUM SILICIDE	TaSi2, TaSi3	x	x	x	99.5%
TITANIUM SILICIDE	Ti5Si2, TaSi3	x	x	x	99.9%
TUNGSTEN SILICIDE	WSi2	x	x	x	99.9%
VANADIUM SILICIDE	VSi2, V3Si	x	x	x	99.5%
ZIRCONIUM SILICIDE	ZrSi2	x	x	x	99.5%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
ARSENIC SULFIDE	As2S3	x	x	x	99.9%
CADMIUM SULFIDE	CdS	x	x	x	99.99%
INDIUM SULFIDE	In2S3	x	x	x	99.99%
LEAD SULFIDE	PbS	x	x	x	99.9%
MOLYBDENUM SULFIDE	MoS2	x	x	x	99%
TANTALUM SULFIDE	TaS2	x	x	x	99.9%
TUNGSTEN SULFIDE	WS2	x	x	x	99.8%
ZINC SULFIDE	ZnS	x	x	x	99.99%
ZIRCONIUM SULFIDE	ZrS2	x	x	x	99.9%

Metals	Composition	Sputtering Targets	E-Beam Sources	Evap. Mat'ls	Purities
CADMIUM TELLURIDE	CdTe	x	x	x	99.99%
LEAD TELLURIDE	PbTe	x	x	x	99.99%
MOLYBDENUM TELLURIDE	MoTe2	x	x	x	99.9%
NIOBIUM TELLURIDE	NbTe2	x	x	x	99.8%
TANTALUM TELLURIDE	TaTe2	x	x	x	99.8%
TUNGSTEN TELLURIDE	WTe2	x	x	x	99.8%
ZINC TELLURIDE	ZnTe	x	x	x	99.99%

PRODUCTS