Phantom RIE


The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.

  • MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.
Fluorine Etch Processes(SF6, CF4, CHF3, O2)
  • Carbon
  • Epoxy
  • InSb
  • Ir
  • Mo
  • Nb
  • OxyNitride
  • Polyimide
  • Si3N4
  • SiC
  • Ta
  • TaN
  • TiW
  • TiN
  • W

PTek, located at Hyderabad, is engaged in offering best equipment and services to the industry and research institutes in the field of Air Filter Testing, Aerosol generation, Semiconductor Process Equipment & Cryogenic systems.