Minilock-Orion PECVD


ImageThe Minilock-Orion is a Plasma Enhanced Chemical Vapor Deposition system with a vacuum loadlock that produces production-quality films on a compact platform. By adding a loadlock, dopants can be used on the PECVD films. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels.

ImageThe system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Minilock-Orion has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.

  • MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.
Toxic/Pyrophoric PECVD Processes
Films Deposited
  • Oxides
  • Oxynitrides
  • Nitrides
  • Amorphous Silicon
  • Silicon Carbide
Process Gases:
  • 100% Silane
  • Ammonia
  • TEOS
  • Diethylsilane
  • Nitrous Oxide
  • Oxygen, Nitrogen
  • Trimethylsilane
  • Methane

PTek, located at Hyderabad, is engaged in offering best equipment and services to the industry and research institutes in the field of Air Filter Testing, Aerosol generation, Semiconductor Process Equipment & Cryogenic systems.