Minilock – Phantom DRIE

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The Minilock – Phantom RIE is a Reactive Ion Etch system with a vacuum loadlock. The Loadlock allows the main chamber to continue pumping whilst a sample is loaded, or unloaded, and is ideal for toxic gas chemistries.

The system is highly configurable with such options as a ICP, and endpoint.

Applications
  • Compound Semiconductor, Failure Analysis, Research & Development, Pilot Line.
Corrosive Chemistry Etch(Cl2, BCl3, SiCl4, HBr, NF3, etc.)
  • AlGaAs
  • Au
  • Carbon
  • Cr
  • Cu
  • GaN
  • GaAs
  • InAIGaN
  • InGaAs
  • Polysilicon
  • InGaN
  • InP
  • LED MQMs
  • PT
  • Si
  • SiC
  • Ti
  • Pr and other organic materials

PTek, located at Hyderabad, is engaged in offering best equipment and services to the industry and research institutes in the field of Air Filter Testing, Aerosol generation, Semiconductor Process Equipment & Cryogenic systems.