Minilock-Orion PECVD

The Minilock-Orion is a Plasma Enhanced Chemical Vapor Deposition system with a vacuum loadlock that produces production-quality films on a compact platform. By adding a loadlock, dopants can be used on the PECVD films. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels.

The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Minilock-Orion has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.

Applications

• MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.

Toxic/Pyrophoric PECVD Processes

Films Deposited

• Oxides
• Oxynitrides
• Nitrides
• Amorphous Silicon
• Silicon Carbide

Process Gases:

• 100% Silane
• Ammonia
• TEOS
• Diethylsilane
• Nitrous Oxide
• Oxygen, Nitrogen
• Trimethylsilane
• Methane